发明名称 Photosensitive resin compositon, photosesitive resist for color filter, and process for producing color filter
摘要 An object of the present invention is to provide a photosensitive resin composition or a photosensitive resist for color filters which is superior in heat resistance, water resistance, solvent resistance, chemical resistance, and also transparency, and a method for producing color filters using them. The present invention relates to a photosensitive resin composition comprising a vinyl polymer (A) having at least one cyclocarbonate group and at least one carboxyl group in the molecule and a compound (B) having at least two ethylenically unsaturated double bonds in the molecule as a main component, which can introduce crosslinked structures by photocuring and thermosetting, a photosensitive resist for color filters comprising the photosensitive resin composition and a colorant, and a method for producing a color filter, using the photosensitive resist for color filters.
申请公布号 US2004096757(A1) 申请公布日期 2004.05.20
申请号 US20030471751 申请日期 2003.09.25
申请人 TOKUDA HIROYUKI;HIROTA YASUNOBU;ISHIKAWA HIDENOBU 发明人 TOKUDA HIROYUKI;HIROTA YASUNOBU;ISHIKAWA HIDENOBU
分类号 C08F2/48;G02B5/22;G03F7/00;G03F7/033;(IPC1-7):G03F7/40;C08L33/14;G03F7/004;G03F7/075 主分类号 C08F2/48
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