| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing method and a plasma processing apparatus, capable of suppressing oxidation of an object to be treated during plasma processing and improving the processing rate, without increasing the RF power. <P>SOLUTION: Helium, supplied from a helium cylinder 1, is made to come into direct contact with pure water 5 in a steam mixer 3 and is supplied to a plasma processing unit 4. In the plasma processing unit 4, plasma is generated by the application of a high-frequency voltage from a high-frequency power supply 6, and organic substances on a work 43 are removed by the oxidizing action of the oxygen and the reducing action of hydrogen generated by the activated water. <P>COPYRIGHT: (C)2004,JPO |
