发明名称 |
X-RAY MASK AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: An X-ray mask and its manufacturing method are provided to considerably increase the predetermined surface area for operating as a window at the X-ray mask by using a polyimide film. CONSTITUTION: One surface of a double-sided adhesive film(21) is attached on a substrate(20) and a polymer film(22) is attached on the other surface of the double-sided adhesive film as a mask base layer. A plating base layer(23) is formed on the polymer film. A photoresist layer is coated on the plating base layer. The plating base layer is partially exposed by selectively patterning the photoresist layer. An X-ray absorbing part(25) is formed on the exposed plating base layer. Then, the patterned photoresist layer is removed from the resultant structure for exposing the other portion of the plating base layer. Then, the exposed portion of the plating base layer is removed. The double-sided adhesive film of the mask base layer is separated from the polymer film. Preferably, a polyimide film is used as the polymer film.
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申请公布号 |
KR20040042491(A) |
申请公布日期 |
2004.05.20 |
申请号 |
KR20020070800 |
申请日期 |
2002.11.14 |
申请人 |
KOREA ELECTRONICS TECHNOLOGY INSTITUTE;LG ELECTRONICS INC. |
发明人 |
CHO, JIN U;CHOI, YEONG JUN;JUNG, SEOK WON;OH, HYEON SEOK;PARK, SEOK HO |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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