ARTICLE COATED WITH ZIRCONIUM COMPOUND FILM, METHOD FOR PRODUCING THE ARTICLE, AND SPUTTERING TARGET USED FOR COATING WITH THE FILM

摘要

PROBLEM TO BE SOLVED: To solve the problem wherein a low film formation rate or arching formation makes it incapable to apply a high power in forming a zirconium compound film on the surface of a substrate such as sheet glass by a reactive sputtering method. SOLUTION: The method for producing a zirconium compound film on a substrate by a sputtering method uses a zirconium target containing a metal (typically, tin or zinc) which has a sputtering rate at least twice as high as that of zirconium in an argon atmosphere instead of a conventional metallic zirconium target. An article coated with a zirconium compound film and a sputtering target used for coating with the film are also provided. The zirconium target desirably contains 1 to 45 atom% of the metal and may contain a third metal. COPYRIGHT: (C)2004,JPO