发明名称 METHOD AND APPARATUS FOR INSPECTING DEFECTS
摘要 <P>PROBLEM TO BE SOLVED: To detect defects in a minute wiring pattern formed on a sample by improving the contrast of an optical image of the sample formed by the interference between the zeroth and higher-order diffracted light of reflected light arising from illuminating light reflected by the sample surface, in a defects detecting optical system which detects defects in a pattern formed on the sample surface. <P>SOLUTION: A high resolution optical system is constructed by an illuminating optical system which illuminates the sample with polarized light, a polarization optical component which transmits higher order diffracted light after being subjected to polarization rotation by the sample more efficiently than the zeroth light, and a detecting optical system which forms an image of the sample onto a photoelectric conversion device with light transmitted through or reflected by the polarization optical component. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004144764(A) 申请公布日期 2004.05.20
申请号 JP20040000105 申请日期 2004.01.05
申请人 HITACHI LTD 发明人 SHIBATA YUKIHIRO;MAEDA SHUNJI;YAMAGUCHI KAZUO;YOSHIDA MINORU;YOSHIDA ATSUSHI;NINOMIYA TAKANORI;MATSUI SHIGERU;OKA KENJI;WATANABE KENJI
分类号 G01B11/30;G01N21/956;G02B21/06;G06T1/00;H01L21/66 主分类号 G01B11/30
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