Extracting method of pattern contour, image processing method, searching method of pattern edge, scanning method of probe, manufacturing method of semiconductor device, pattern inspection apparatus, and program

摘要

An extracting method of a pattern contour, includes acquiring an image of a pattern to be inspected, calculating a schematic edge position of the pattern from the image, preparing an approximate polygon by approximating a polygon consisting of edges having predetermined direction components to a contour shape of the pattern on the basis of the calculated edge position, dividing the approximate polygon into star-shaped polygons, calculating the position of a kernel of the star-shaped polygon, and searching an edge of the pattern in a direction connecting the kernel to an arbitrary point positioned on the edge of the approximate polygon.