发明名称 |
LOW EMISSIVITY GLASS AND METHOD FOR PRODUCTION THEREOF |
摘要 |
The present invention provides a low emissivity glass including a first layer containing silicon oxide as its main component, a second layer containing tin oxide as its main component, a third layer containing silicon oxide as its main component, and a fourth layer containing tin oxide as its main component that are formed on a glass sheet with a thickness of at least 6 mm. The low-emissivity glass has a haze ratio of 0.7% or lower. In this low emissivity glass, the glass ribbon has a surface temperature of at least 700 DEG C when the first layer is deposited and a surface temperature of at least 640 DEG C when the second to fourth layers are deposited. It can be produced by a method involving thermal decomposition of a coating-film depositing material, for instance, by a CVD method. <IMAGE>
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申请公布号 |
EP1419997(A1) |
申请公布日期 |
2004.05.19 |
申请号 |
EP20010951960 |
申请日期 |
2001.07.23 |
申请人 |
NIPPON SHEET GLASS COMPANY, LIMITED |
发明人 |
HYODO, MASATO;KIYOHARA, KOICHIRO |
分类号 |
C03C17/34;(IPC1-7):C03C17/34 |
主分类号 |
C03C17/34 |
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