LEVELING MEASUREMENT APPARATUS USED IN EXPOSURE PROCESS

摘要

PURPOSE: A leveling measurement apparatus used in an exposure process is provided to be capable of obtaining predetermined data for direct leveling control at the one-shot region of the edge of a wafer. CONSTITUTION: A leveling measurement apparatus is provided with a supporter part(200) for supporting a semiconductor substrate and a sensor part for measuring the focusing and tilt according to each predetermined interval of the semiconductor substrate. The supporter part includes an inner plate(210) having the same size as the semiconductor substrate and a flat outer plate(220) for selectively enclosing the inner plate in order to measure the focusing and tilt of the edge portion of the semiconductor substrate. Preferably, the outer plate is capable of reflecting the light emitted from the sensor part.