摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition causing little pattern falling even when a fine pattern is formed. <P>SOLUTION: The positive resist composition comprises: (A) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and increasing the solubility with respect to an alkali developer liquid by the effect of an acid; (B) a compound generating an acid by irradiation of active rays or radiation; (C) an amine compound having a bridged polycyclic structure; and (D) a solvent. Thus, the favorable positive resist composition which hardly causes pattern falling can be obtained. <P>COPYRIGHT: (C)2004,JPO |