发明名称 POSITIVE RESIST COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a positive resist composition causing little pattern falling even when a fine pattern is formed. <P>SOLUTION: The positive resist composition comprises: (A) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and increasing the solubility with respect to an alkali developer liquid by the effect of an acid; (B) a compound generating an acid by irradiation of active rays or radiation; (C) an amine compound having a bridged polycyclic structure; and (D) a solvent. Thus, the favorable positive resist composition which hardly causes pattern falling can be obtained. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004138892(A) 申请公布日期 2004.05.13
申请号 JP20020304551 申请日期 2002.10.18
申请人 FUJI PHOTO FILM CO LTD 发明人 NAKAO HAJIME
分类号 G03F7/039;G03F7/004;H01L21/027 主分类号 G03F7/039
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