SURFACE MICROSTRUCTURE AND ITS PRODUCTION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a novel technique of simply forming a micropattern on a substrate.

SOLUTION: The surface microstructure is prepared by forming columns having an average diameter of 150 to 400nm and an average length of 300 to 2,000nm on the surface of a glassy carbon substrate at intervals of 150 to 400nm. The method comprises subjecting the glassy carbon substrate to dry etching by a plasma method.

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