发明名称 MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a technology capable of evaluating adhesion forces between a substrate and all kinds of thin film being formed on the substrate. SOLUTION: In the method of the technology, a scribe line 9 is formed on a surface of a semiconductor wafer 1, and then the semiconductor wafer 1 is cleft along the scribe line 9 by using a cleaving blade 8, thereby separating off a wafer piece 1b. Next, the cleaving blade 8 is sent down vertically, and the wafer piece 1b is fixed in a gap 8a of the cleaving blade 8, and then the cleaving blade 8 is sent down obliquely, thereby peeling off an electrode film 2 in the rear surface of the semiconductor wafer 1, and the surface where the electrode film 2 is peeled of is observed or measured, thereby evaluating the adhesion force of the electrode film 2. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004138469(A) 申请公布日期 2004.05.13
申请号 JP20020302628 申请日期 2002.10.17
申请人 RENESAS TECHNOLOGY CORP 发明人 TOTSUKA HIROYUKI;IHAYAZAKA TAKASHI;SAGAWA SHIGEKAZU
分类号 G01N19/04;H01L21/66;(IPC1-7):G01N19/04 主分类号 G01N19/04
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