发明名称 PROJECTION OPTICAL SYSTEM AND EXPOSURE APPARATUS EQUIPPED THEREWITH
摘要 PROBLEM TO BE SOLVED: To provide a reflection type projection optical system which has good reflection characteristics even to X-rays and where reflection mirrors are prevented from getting larger and an aberration is excellently compensated. SOLUTION: An image forming apparatus is equipped with the six reflection mirrors and forms a reduced image of a first surface (4) onto a second surface (7). The apparatus is equipped with a first reflection image forming optical system (G1) for forming an intermediate image of the first surface and a second reflection image forming optical system (G2) for forming the image of the intermediate image on the second surface. The first reflection image forming optical system has, in order of light incidence from the first surface side, the first reflection mirror (M1), an aperture-stop (AS), the second reflection mirror (M2), the third reflection mirror (M3), and the fourth reflection mirror (M4). The second reflection image forming optical system has, in order of light incidence from the first surface side, the fifth reflection mirror (M5) and the sixth reflection mirror (M6). COPYRIGHT: (C)2004,JPO
申请公布号 JP2004138926(A) 申请公布日期 2004.05.13
申请号 JP20020305211 申请日期 2002.10.21
申请人 NIKON CORP 发明人 TAKAHASHI TOMOWAKI
分类号 G02B17/00;G02B13/14;G02B17/06;G03F7/20;H01L21/027;(IPC1-7):G02B17/00 主分类号 G02B17/00
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