发明名称 |
Liner with poor step coverage to improve contact resistance in W contacts |
摘要 |
A method of filling a damascene structure with liner and W characterized by improved resistance and resistance spread and adequate adhesion comprising: a given damascene structure coated by a liner which purposely provides poor step coverage into the afore mentioned structure, followed by a CVD W deposition, and followed by a metal isolation technique.
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申请公布号 |
US6734097(B2) |
申请公布日期 |
2004.05.11 |
申请号 |
US20010965094 |
申请日期 |
2001.09.28 |
申请人 |
INFINEON TECHNOLOGIES AG;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
IGGULDEN ROY C.;SHAFER PADRAIC;ROBL WERNER;WONG KWONG HON |
分类号 |
H01L21/768;(IPC1-7):H01L21/476 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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