Method of and computer program product for designing patterns, and method of manufacturing semiconductor device

摘要

A method of designing patterns has preparing a mask pattern used in a lithography process for transferring a circuit pattern intersecting with a step pattern on a substrate which has the step pattern designed thereon, and applying correction patterns to the mask pattern in accordance with correction rules considering a shape of the step pattern, the correction patterns being applied at intersections of edges of the circuit pattern and the step pattern and in the vicinity of the intersections.