发明名称 |
Auxiliary electromagnets in a magnetron sputter reactor |
摘要 |
A magnetron sputter reactor having a complexly shaped target with a vault arranged about a central axis facing the wafer. The vault may be right cylindrical with axially magnetized magnets disposed in back of its sidewall or be annular with preferably opposed magnets disposed in back of its two sidewalls. One or two electromagnetic coils are disposed about the processing space between the target and the wafer to either promote extraction of metal ions from the vault, to defocus the ion beam extracted from the vault and focused towards the central axis, or to compensate for a magnetic shield surrounding the reactor.
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申请公布号 |
US6730196(B2) |
申请公布日期 |
2004.05.04 |
申请号 |
US20020210953 |
申请日期 |
2002.08.01 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
WANG WEI D.;GOPALRAJA PRABURAM;FU JIANMING |
分类号 |
C23C14/04;C23C14/16;C23C14/35;H01J37/34;H01L21/768;(IPC1-7):C23C14/35 |
主分类号 |
C23C14/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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