发明名称 METHOD FOR FORMING FINE PATTERN
摘要 PROBLEM TO BE SOLVED: To improve throughput by reducing the occurrence of defects in microfabrication using a coating forming agent. SOLUTION: The fine patterns are formed by coating the surface of a substrate having photoresist patterns with a coating forming agent for scaling down of the patterns, then by thermally shrinking the coating forming agent by heat treatment to narrow the spacing between the photoresist patterns by utilizing the thermal shrinkage effect thereof, thereafter by bringing the coating forming agent into contact with a removing liquid for the time exceeding 60 second, thereby the patterns are removed. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004133192(A) 申请公布日期 2004.04.30
申请号 JP20020297525 申请日期 2002.10.10
申请人 TOKYO OHKA KOGYO CO LTD 发明人 KANEKO FUMITAKE;SUGATA YOSHIKI;TACHIKAWA TOSHIKAZU
分类号 G03F7/40;H01L21/027;(IPC1-7):G03F7/40 主分类号 G03F7/40
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