| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for supplying a material of a photoresist or the like for substantially preventing formation of minute bubbles, and to provide its system. <P>SOLUTION: The photoresist supply system includes a resist storing bottle, and an acceptor connected so that a fluid passes through thereto. A vacuum pump is ventilated with and connected to the acceptor, and a vacuum condition is formed inside the acceptor to suck the resist from the storing bottle so as to take it in the acceptor. An introduction part of the acceptor is formed so as to allow the resist to flow in downward from the inner wall. The resist flows out from the acceptor to flow in a resist supply container, and is pumped therefrom to a feed nozzle to be applied on a wafer or a substrate. <P>COPYRIGHT: (C)2004,JPO |
