发明名称 ELECTRON SOURCE, ITS MANUFACTURING METHOD, AND FLAT IMAGE PICKUP ELEMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an electron source capable of realizing a photoconductive type flat image pickup element with shading and degradation of resolution reduced; to provide its manufacturing method; and to provide the flat image pickup element. <P>SOLUTION: In this electron source 10, its region on a substrate 12 is divided into: a rectangular region A1 corresponding to a scanning region of a photoelectric conversion part; a frame-like region A2 corresponding to a non-scanning region thereof; and the outermost peripheral region A3. Electron emission sources 32 are formed on first cathode electrodes 14a-14d in the rectangular region A1 by facing them to first gate electrodes 26a-26d, and electron emission sources 35 are formed on second cathode electrodes 18a-18d and the like in the frame-like region A2 by facing them to a second gate electrode 30. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004134144(A) 申请公布日期 2004.04.30
申请号 JP20020295437 申请日期 2002.10.08
申请人 NIPPON HOSO KYOKAI <NHK> 发明人 YAMAGISHI TOSHIRO;NANBA MASAKAZU;TAKIGUCHI YOSHIRO;OKAZAKI SABURO;OSADA SHOGEN;EGAMI NORIFUMI
分类号 H01L27/14;H01J9/02;H01J29/04;H01J31/38;H04N5/30;(IPC1-7):H01J29/04 主分类号 H01L27/14
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