发明名称 METAL LINE METHOD EVEN THOUGH IT HAS UNDERCUT
摘要 PURPOSE: A metal line method is provided to connect the metal line to the via hole having the undercut by using an ion milling unit. CONSTITUTION: A MEMS(Micro-Electronic Mechanical System) device(23) is installed on an upper surface of a silicon substrate(22). A glass wafer is adhered to an upper surface of the silicon substrate(22) having the MEMS device(23). In a MEMS packaging process for adhering the glass to the silicon substrate, a metal layer is deposited on a hole(26) of the glass wafer(24). The deposited layer is redeposited by performing an ion milling process.
申请公布号 KR20040034949(A) 申请公布日期 2004.04.29
申请号 KR20020063608 申请日期 2002.10.17
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HONG, SEOK U;JUN, CHAN BONG;JUNG, GYU DONG;JUNG, SEOK HWAN;KANG, JEONG HO;KANG, SEOK JIN;KIM, JONG SEOK;LEE, MUN CHEOL;SONG, GI MU
分类号 B81C1/00;B81B7/00;H01L21/28;H01L21/768;H01L23/522;(IPC1-7):H01L21/28 主分类号 B81C1/00
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