PURPOSE: A metal line method is provided to connect the metal line to the via hole having the undercut by using an ion milling unit. CONSTITUTION: A MEMS(Micro-Electronic Mechanical System) device(23) is installed on an upper surface of a silicon substrate(22). A glass wafer is adhered to an upper surface of the silicon substrate(22) having the MEMS device(23). In a MEMS packaging process for adhering the glass to the silicon substrate, a metal layer is deposited on a hole(26) of the glass wafer(24). The deposited layer is redeposited by performing an ion milling process.
申请公布号
KR20040034949(A)
申请公布日期
2004.04.29
申请号
KR20020063608
申请日期
2002.10.17
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
HONG, SEOK U;JUN, CHAN BONG;JUNG, GYU DONG;JUNG, SEOK HWAN;KANG, JEONG HO;KANG, SEOK JIN;KIM, JONG SEOK;LEE, MUN CHEOL;SONG, GI MU