SUBSTRATE HOLDING DEVICE WITH IMPROVED PROTRUSION ARRAY, EXPOSURE APPARATUS WITH THE SAME, AND DEVICE MANUFACTURING METHOD

摘要

PURPOSE: A substrate holding device, an exposure apparatus with the same, and a device manufacturing method are provided to absorb satisfactorily a wafer by improving the array of pin-type protrusions. CONSTITUTION: A substrate holding chuck(9) includes protrusions for supporting a substrate. The protrusions include pin-type protrusions(12) on a vacuum surface and a circular first peripheral wall(14). The substrate holding chuck is composed of a first region and a second region. The first region includes the pin-type protrusions arrayed along the first peripheral wall. The second region includes the pin-type protrusions arrayed like a lattice structure in the first region.