| 摘要 |
<p>A micro-cast silicon carbide nano-imprinting stamp comprises a handling substrate, a glue layer, a foundation layer, and nano-sized features connected with the foundation layer and extending outward of the base surface of foundation layer. The nano-sized features have an outer surface defining an imprint profile. The foundation layer and nano-sized features are micro-cast unitary whole formed from silicon carbide-containing material. A micro-cast silicon carbide nano-imprinting stamp comprises a handling substrate (15), a glue layer (17) connected with the handling substrate, a foundation layer (11) connected with the glue layer and including a base surface (13), and nano-sized features (12) connected with the foundation layer and extending outward of the base surface. The nano-sized features have an outer surface defining an imprint profile. The foundation layer and nano-sized features are micro-cast unitary whole formed from silicon carbide-containing material. An independent claim is also included for micro-casting a silicon carbide nano-imprinting stamp by patterning and etching a mold layer to form nano-sized mold cavities, forming nano-sized features and a foundation layer by filling the nano-sized cavities with silicon-carbide containing material, planarizing the foundation layer to form a planar surface, forming a glue layer on the planar surface, bonding a handling substrate with the glue layer by applying pressure and heat to the handling substrate and mold layer until the glue layer forms a mechanical bond with the foundation layer and handling substrate, and removing the mold layer from the foundation layer.</p> |
