| 摘要 |
PURPOSE: An apparatus for manufacturing a semiconductor device is provided to be capable of effectively exhausting polymers to the outside for minimizing the polymers from being deposited at a wafer or a chamber wall. CONSTITUTION: An apparatus for manufacturing a semiconductor device is provided with a process chamber(120) for carrying out a predetermined process, a susceptor installed in the process chamber for loading a substrate, a gas jet part(220) installed at the upper portion of the susceptor in the process chamber, and a gas supply line for supplying process gas into the process chamber. The apparatus further includes an exhaust plate(300) located at the lower portion of the process chamber. At this time, a plurality of exhaust holes are formed at the exhaust plate for exhausting the process gas or polymers. Preferably, the exhaust plate is a ring type structure.
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