发明名称 Method for manufacturing a thin-film transistor comprising a recombination center
摘要 The present invention provides a thin-film transistor (TFT) and its production method which enables an arrangement restraining bipolar transistor type behavior, in order to stabilize saturation current and to provide a TFT that can improve reliability. The TFT includes a channel region facing a gate electrode through a gate insulating film, a source electrode connected to the channel region and a drain region connected to the channel region on the side opposite this source region are formed in a polycrystal semiconductor film that was patterned in island forms. In the channel region, a recombination center is formed for capturing a small number of carriers (holes) by introducing impurities, such as inert gases, metals, Group III elements, Group IV elements and Group V elements after a crystallization process is carried out on a semiconductor film 100.
申请公布号 US6727123(B2) 申请公布日期 2004.04.27
申请号 US20010936041 申请日期 2001.12.18
申请人 SEIKO EPSON CORPORATION 发明人 YUDASAKA ICHIO;MIYASAKA MITSUTOSHI;MIGLIORATO PIERO
分类号 H01L21/20;H01L21/336;H01L29/786;(IPC1-7):H01L21/00;H01L21/84 主分类号 H01L21/20
代理机构 代理人
主权项
地址