发明名称 CAPACITOR STRUCTURE AND METHOD FOR PRODUCING THE SAME USING DUAL DAMASCENE PROCESS
摘要 PROBLEM TO BE SOLVED: To provide a capacitor structure and a method for producing the structure using a dual damascene process. SOLUTION: In the apparatus and production process, a capacitor is formed using a dual damascus process. A bottom plate of the capacitor is electrically connected to an upper first conductive via that is formed according to the dual damascene process. A top plate of the capacitor is connected to an upper second conductive via. A dielectric material is disposed between the top and bottom plates. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004128498(A) 申请公布日期 2004.04.22
申请号 JP20030334485 申请日期 2003.09.26
申请人 AGERE SYSTEMS INC 发明人 MERCHANT SAILESH M;YAN YIFENG W
分类号 H01L21/02;H01L21/768;H01L21/822;H01L23/522;H01L27/04;(IPC1-7):H01L21/822 主分类号 H01L21/02
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