| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma doping method and equipment, which are capable of obtaining a certain doping concentration with high controllability and reproducibility. SOLUTION: A vacuum vessel 1 is exhausted with a pump 3 while the prescribed gas is introduced into the vacuum vessel 1 from a gas supply device 2. When a high-frequency power is applied to a coil 8 from a high-frequency power supply 5 as the internal pressure of the vacuum vessel 1 is maintained at a prescribed value, a plasma is generated inside the vacuum vessel 1, so that a substrate 9 mounted on a specimen electrode 6 is subjected to plasma doping. At this point, the travelling waves Pf and reflected waves Pr of the high-frequency power fed to the specimen electrode are sampled at a high speed so as to improve the controllability and reproducibility. COPYRIGHT: (C)2004,JPO
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