发明名称 |
Method for STI etching using endpoint detection |
摘要 |
A method for dry etching a feature to control an etching depth using endpoint detection and a sacrificial hardmask including providing a substrate for etching a feature opening into said substrate, said substrate provided with at least a first dielectric layer overlying the substrate; providing at least a second dielectric layer including a sacrificial hardmask at a predetermined thickness over the at least a first dielectric layer; photolithographically patterning and etching in a first dry etching process through a thickness of the at least a second dielectric layer and the at least a first dielectric layer to expose the substrate for dry etching the feature opening; and, dry etching in a second dry etching process the substrate and the sacrificial hardmask layer to endpoint detection of an underlying layer with respect to the sacrificial hardmask layer to thereby etch through a predetermined thickness of the substrate.
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申请公布号 |
US2004077163(A1) |
申请公布日期 |
2004.04.22 |
申请号 |
US20020274707 |
申请日期 |
2002.10.21 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHANG YAO-CHI;LU JEFF |
分类号 |
H01L21/033;H01L21/308;H01L21/762;(IPC1-7):H01L21/00;H01L21/302;H01L21/461 |
主分类号 |
H01L21/033 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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