| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition which has satisfactory sensitivity and an excellent profile and hardly causes the fluctuation of the sensitivity in the lapse of time during the preservation of a resist solution. <P>SOLUTION: The positive resist composition comprises a resin (A) which is degraded by the action of acid and increases the solubility in an alkaline development solution, a specified phenacyl sulfonium compound (B) and a specified Meldrum's acid compound (C). <P>COPYRIGHT: (C)2004,JPO |
