发明名称 Exposure apparatus and its making method, substrate carrying method, device manufacturing method and device
摘要 The apparatus comprises a substrate stage (WST) to mount a substrate (W) and a substrate carriage system (100) to carry a substrate to the substrate stage. The substrate carriage system includes a rotation table (42) that holds and moves the substrate in the X direction and a control system that detects the positional deviation of the substrate W rotating together with the rotation table (42) by using sensors (48) while moving in the X direction. Since the detection of the positional deviation of the substrate overlaps with the time the substrate is being carried, it improves the throughput, as well as improves the space efficiency since exclusive space for detection of the positional deviation is not required. Accordingly, this can reduce the manufacturing cost of devices such as semiconductor devices.
申请公布号 US2004075822(A1) 申请公布日期 2004.04.22
申请号 US20030683236 申请日期 2003.10.14
申请人 NIKON CORPORATION 发明人 HATTORI KEN
分类号 G03F7/20;H01L21/00;H01L21/677;H01L21/68;(IPC1-7):G03B27/58 主分类号 G03F7/20
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