发明名称 METHOD FOR ELIMINATING VOIDING IN PLATED SOLDER
摘要 A method for plating solder is provided. In accordance with the method, a die having a seed metallization thereon is provided. The seed metallization is microetched (85) with a solution comprising an acid and an oxidizer, thereby forming an etched seed metallization. An under bump metallization (UBM) is then electroplated (87) onto the etched seed metallization, and a lead-free solder composition, such as SnCu, is electroplated (91) onto the UBM. A method for reflowing solder is also provided, which may be used in conjunction with the method for plating solder. In accordance with this later method, the substrate is subjected to a seed metallization etch (137), followed by a microetch (141). A solder flux is then dispensed onto the substrate (147) and the solder is reflowed (149).
申请公布号 WO2004034460(A2) 申请公布日期 2004.04.22
申请号 WO2003US30860 申请日期 2003.09.30
申请人 MOTOROLA, INC. 发明人 FAY, OWEN
分类号 C23F1/34;C23F1/38;H01L21/60 主分类号 C23F1/34
代理机构 代理人
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