| 摘要 |
PROBLEM TO BE SOLVED: To provide a quartz glass part which hardly produces particles in a film deposition process or plasma treatment of semiconductors, or the like, can be used continuously for a long period of time, can be regenerated, and hardly produces particles same as before regeneration even after it has been regenerated, and to provide a method of manufacturing the same, and a device using the quartz glass part. SOLUTION: The quartz glass part having a quartz thermally sprayed film which has unevenness on its surface and bubbles in its inside or a quartz glass part having dimple form at recessed parts of the unevenness is manufactured by thermally spraying a quartz powder under a condition that a base material is melted, and thereafter etching the sprayed quartz glass by using a solution containing hydrofluoric acid. The obtained quartz glass part is used in a film deposition device, a plasma-etching device, and a plasma cleaning device. COPYRIGHT: (C)2004,JPO
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