| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a rotary coating apparatus which can uniformly apply a coating liquid to a substrate and can reduce the treating time by a rotary coating method in a simple configuration, and to provide a rotary coating method. <P>SOLUTION: In the rotary coating apparatus the coating liquid is applied to the substrate 11 and dried while the substrate 11 is rotated at a high speed. The apparatus comprises a gas jetting unit 51 for jetting a gas to the surface of the the substrate 11 and drying up the coating liquid. In the gas jetting device 51, the amount of the gas blown to the surface of the the substrate 11 is made to decrease as the position goes away from the center of the rotation of the substrate 11. A gas jetting outlet 53 of the gas jetting device 51 is arranged only in the range corresponding to an inscribed circle C of the substrate 11, having the center S of rotation of the substrate 11. <P>COPYRIGHT: (C)2004,JPO |
