发明名称 |
Apparatus for measuring film thickness formed on object, apparatus and method of measuring spectral reflectance of object, and apparatus and method of inspecting foreign material on object |
摘要 |
A film thickness measurement apparatus (1) comprises an ellipsometer (3) for acquiring a polarization state of a film on a substrate (9) and a light interference unit (4) for acquiring spectral intensity of the film on the substrate (9). In an optical system (45) of the light interference unit (4), a light shielding pattern (453a) is disposed in an aperture stop part (453), and an illumination light from a light source (41) is emitted to the substrate (9) through the optical system (45). A reflected light from the substrate (9) is guided to a light shielding pattern imaging part (43), where an image of the light shielding pattern (453a) is acquired. When the ellipsometer (3) performs a film thickness measurement, a tilt angle of the substrate (9) is obtained on the basis of the image of the light shielding pattern (453a) and a light receiving unit (32) acquires a polarization state of the reflected light. An calculation part (51) obtains a thickness of a film with high precision from the polarization state of the reflected light by using the obtained tilt angle.
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申请公布号 |
US2004075836(A1) |
申请公布日期 |
2004.04.22 |
申请号 |
US20030652071 |
申请日期 |
2003.09.02 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
HORIE MASAHIRO;HAYASHI HIDEKI;KITAMURA FUJIKAZU;AKASHIKA KUMIKO |
分类号 |
G01B11/06;G01B11/16;G01N21/21;G01N21/27;G01N21/45;G01N21/88;G01N21/95;G01N21/956;H01L21/66;(IPC1-7):G01J4/00 |
主分类号 |
G01B11/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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