发明名称 Apparatus and method for irradiating a substrate
摘要 A system for processing a multilayer liquid crystal film display material, with multiple irradiation apparatus (60) for applying a zone of polarized UV irradiation onto a substrate fed from a web (16) with incident light at a desired angle. Each irradiation apparatus (60) includes a UV light source (64), and one or more optional filters (82). A polarizer (90) is provided, sized and arranged to polarize light over the web (16) as it moves. The irradiation apparatus (60) employs an array of louvers (81) and/or a prism array (72). One irradiation apparatus (60) irradiates a first LPP1 layer (22) at a 0-degree alignment, in the web movement direction, the other irradiation apparatus (60) irradiates an LPP2 layer (26) with an orthogonal 90-degree alignment. <IMAGE>
申请公布号 EP1380873(A3) 申请公布日期 2004.04.21
申请号 EP20030077020 申请日期 2003.06.30
申请人 EASTMAN KODAK COMPANY 发明人 LEIDIG, CARL F.;KESSLER, DAVID;DONNER, JANET;LIANG, RONGGUANG;MI, XIANG-DONG
分类号 G02B5/30;G02F1/13;G02F1/13363;G02F1/1337;G21K5/10 主分类号 G02B5/30
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