SYSTEM FOR IN-SITU GENERATION OF FLUORINE RADICALS AND/OR FLUORINE-CONTAINING INTERHALOGEN (XFN) COMPOUNDS FOR USE IN CLEANING SEMICONDUCTOR PROCESSING CHAMBERS,申请号AU20030270859-传众专利搜索

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发明名称	SYSTEM FOR IN-SITU GENERATION OF FLUORINE RADICALS AND/OR FLUORINE-CONTAINING INTERHALOGEN (XFN) COMPOUNDS FOR USE IN CLEANING SEMICONDUCTOR PROCESSING CHAMBERS
摘要
申请公布号	AU2003270859(A1)	申请公布日期	2004.04.19
申请号	AU20030270859	申请日期	2003.09.23
申请人	ADVANCED TECHNOLOGY MATERIALS, INC.	发明人	JOSE, I. ARNO;W., KARL OLANDER
分类号	B08B7/00;C23C16/44	主分类号	B08B7/00
代理机构		代理人
主权项
地址

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