| 摘要 |
PROBLEM TO BE SOLVED: To provide an organic vapor deposition system of large area for an organic thin film and an organic element, and to provide an organic vapor deposition method. SOLUTION: The organic vapor deposition system is composed of a vapor deposition part and a source part. The vapor deposition part is composed of a reaction chamber 100, a substrate supporting part 130 provided inside the reaction chamber, a substrate temperature control part 150 controlling the temperature of a substrate, and a shower head 110 distributing an organic source vapor phase participating in vapor deposition reaction to a substrate. The source part is composed of source chambers 300 and 300' generating the organic source vapor phase fed by the shower head, a source heating part 500 covering the source chambers and vaporizing the organic source vapor phase from an organic material in the source chambers, and a transfer gas feed source 410 for transferring the organic source vapor phase to the reaction chamber. Thus, an organic thin film can uniformly be vapor deposited on a substrate with a large area, and the vapor deposition rate can be improved as well. COPYRIGHT: (C)2004,JPO
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