| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate with an ink accepting layer which is excellent in water resistance of characters and images or the like formed by ink and can be formed below 150°C. <P>SOLUTION: The substrate with an ink accepting layer has at least one peak in an X-ray diffraction pattern, and the diffraction angle (2θ) of at least one peak has a layer containing a micelle-containing inorganic oxide (C) represented by the formula, 2θ=2sin<SP>-1</SP>(λ/2d). In the formula, λ is a Kα 1 wavelength (nm) of a characteristic X ray, and (d) is a lattice spacing of 0.8 nm to 150 nm. <P>COPYRIGHT: (C)2004,JPO |
