发明名称 PHOTOSENSITIVE RESIN COMPOSITION USEFUL FOR PROTECTION FILM FOR PHOTO-DEVICE
摘要 PURPOSE: A photosensitive resin composition being suitably used as a protection film material for photo-device is provided by adding polycarboxylic anhydrides to a conventionally used epoxy-containing resin. The composition does not cause yellowing in the resulted protection film, while satisfying the properties such as adhesion to substrate, surface hardness, transparency, heat resistance, UV resistance, chemical resistance and water resistance. CONSTITUTION: The photosensitive resin composition comprises (a-1) unsaturated carboxylic acid and/or unsaturated carboxylic anhydride, (a-2) an unsaturated epoxy-containing compound, and (a-3) a copolymer(represented as A in formula 2) prepared from olefin-based unsaturated material excepting above (a-1) and (a-2); further at least one or two polycarboxylic anhydride(s) selected from compounds of formula 1 or 2, a polymeric compound having ethylenically unsaturated bonds, and a photoinitiator.
申请公布号 KR20040031447(A) 申请公布日期 2004.04.13
申请号 KR20020060895 申请日期 2002.10.07
申请人 KOLON IND. INC./KR 发明人 KIM, JIN HWAN;PARK, JONG MIN;YOON, GYEONG GEUN
分类号 G03F7/004;(IPC1-7):G03F7/004 主分类号 G03F7/004
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