发明名称 |
Quantum well device with ESD endurance and method of forming the same |
摘要 |
The present invention provides a quantum well device and a method of forming the same. The quantum well device comprises alternately stacked n layers of quantum well layers and n layers of barrier layers, wherein the quantum well layers and barrier layers are alternatively doped with dopant, and n is a positive integer. The dopant of a predetermined concentration is applied to control the breakdown voltage and output intensity of the quantum well device and to consequently avoid artificial and mechanical ESD failure.
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申请公布号 |
US6720571(B1) |
申请公布日期 |
2004.04.13 |
申请号 |
US20000643852 |
申请日期 |
2000.08.22 |
申请人 |
UNITED EPITAXY COMPANY, LTD. |
发明人 |
TU CHUAN-CHENG;WU JEN-CHAU;TANG SHIU-MU;HUANG PAO-I |
分类号 |
H01S5/30;H01S5/34;(IPC1-7):H01L29/205 |
主分类号 |
H01S5/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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