发明名称 Quantum well device with ESD endurance and method of forming the same
摘要 The present invention provides a quantum well device and a method of forming the same. The quantum well device comprises alternately stacked n layers of quantum well layers and n layers of barrier layers, wherein the quantum well layers and barrier layers are alternatively doped with dopant, and n is a positive integer. The dopant of a predetermined concentration is applied to control the breakdown voltage and output intensity of the quantum well device and to consequently avoid artificial and mechanical ESD failure.
申请公布号 US6720571(B1) 申请公布日期 2004.04.13
申请号 US20000643852 申请日期 2000.08.22
申请人 UNITED EPITAXY COMPANY, LTD. 发明人 TU CHUAN-CHENG;WU JEN-CHAU;TANG SHIU-MU;HUANG PAO-I
分类号 H01S5/30;H01S5/34;(IPC1-7):H01L29/205 主分类号 H01S5/30
代理机构 代理人
主权项
地址