发明名称 |
PHOTOSENSITIVE RESIN HAVING IMPROVED DEVELOPING MARGIN AND ADHESIVE CHARACTERISTIC |
摘要 |
PURPOSE: A photosensitive resin having a prominent development margin and adhesive characteristic is provided to improve the development margin and the adhesive characteristic by using a crosslinked bond between a monomer having active hydrogen and a silane coupling agent within a binder. CONSTITUTION: A photosensitive resin having a prominent development margin and adhesive characteristic includes a binder of 5 to 30 weight percent, a crosslinkable monomer of 5 to 30 weight percent, paints of 10 to 60 weight percent, a photopolymerization initiator of 0.5 to 5 weight percent, a solvent of 20 to 80 weight percent, and a silane coupling agent of 0.1 to 2 weight percent. The binder melts in alkali aqueous solution. The crosslinkable monomer is formed with two or more ethylene-based double bond. The silane coupling agent has one or more isocyanate base.
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申请公布号 |
KR20040031228(A) |
申请公布日期 |
2004.04.13 |
申请号 |
KR20020060605 |
申请日期 |
2002.10.04 |
申请人 |
DONGJIN SEMICHEM CO., LTD. |
发明人 |
KIM, GIL RAE;KIM, SEUNG GEUN;PARK, CHAN SEOK |
分类号 |
G02B5/20;(IPC1-7):G02B5/20 |
主分类号 |
G02B5/20 |
代理机构 |
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