发明名称 METHOD FOR MANUFACTURING PATTERN FORM
摘要 PROBLEM TO BE SOLVED: To provide an easy and convenient manufacturing method for a pattern form in which a high-definition oxidation pattern is formed by irradiating an inorganic layer surface with energy in a short time. SOLUTION: A photo initiator containing layer side substrate having a photo initiator containing layer containing a photo initiator and a substrate for a pattern form which has an inorganic layer whose surface is oxidized through the operation of the photo initiator in the photo initiator containing layer are arranged across a gap so that the inorganic layer is≤200μm, and then irradiated with energy in a pattern shape to oxidize the surface of the inorganic layer at the energy-irradiate part, and then the photo initiator containing a layer substrate is detached to obtain the pattern form having the oxidized pattern on the inorganic layer surface. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004111480(A) 申请公布日期 2004.04.08
申请号 JP20020268999 申请日期 2002.09.13
申请人 DAINIPPON PRINTING CO LTD 发明人 KOBAYASHI HIRONORI
分类号 H01L21/28;H01L21/3205;(IPC1-7):H01L21/320 主分类号 H01L21/28
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