发明名称 |
PHOTOMASK, METHOD OF PRODUCING IT AND PATTERN FROMING METHOD USING THE PHOTOMASK |
摘要 |
A semi-light shielding portion (3) and a phase shifter (5), passes an exposure light in phase and out-off phase with respect to a translucent portion (4). The phase shifter partially cancels the light passed through the translucent portion and semi-light shielding portion. Independent claims are also included for the following: (1) photomask production method; and (2) mask pattern forming method. |
申请公布号 |
KR20040030061(A) |
申请公布日期 |
2004.04.08 |
申请号 |
KR20047000662 |
申请日期 |
2002.12.24 |
申请人 |
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发明人 |
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分类号 |
H01L21/027;G03F1/29;G03F1/32;G03F1/36;G03F1/68 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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