| 摘要 |
PURPOSE: An exhaust system of a chamber for fabricating a semiconductor including a valve and a TFT LCD is provided to improve the uniformity of a wafer by forming a plurality of holes on the bottom of the chamber and connecting the holes to manual valves for controlling the flow of the remaining gases. CONSTITUTION: An exhaust system of a chamber for fabricating a semiconductor including a valve and a TFT LCD includes a plurality of exhaust holes(411,412), a plurality of exhaust tubes(413,414), a plurality of manual valves(415,416), and a plurality of joining tubes(417,418). The exhaust holes(411,412) are formed on the bottom of the chamber. The exhaust tubes(413,414) are connected to the exhaust holes. The manual valves(415,416) are connected to the exhaust tubes. The joining tubes(417,418) are connected to the manual valves in order to join the remaining gases.
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