发明名称 Apparatus and method for vaporizing solid precursor for CVD or atomic layer deposition
摘要 An apparatus and method for effectively and controllably vaporizing a solid precursor material is provided. In particular, the present invention provides an apparatus that includes a housing defining a sealed interior volume having an inlet for receiving a carrier gas, at least one surface within the housing for the application of a solid precursor, and a heating member for heating the solid precursor. The heating member can be located in the housing or in the surface within the housing. The surface can be a rod, baffle, mesh, or grating, and is preferably s-shaped or cone-shaped. Optionally, an outlet connects the housing to a reaction chamber. A method for vaporizing a solid precursor using the apparatus of the present invention is also provided.
申请公布号 US6718126(B2) 申请公布日期 2004.04.06
申请号 US20010953451 申请日期 2001.09.14
申请人 APPLIED MATERIALS, INC. 发明人 LEI LAWRENCE C.
分类号 C23C16/448;(IPC1-7):C23C14/00;C23C16/00 主分类号 C23C16/448
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