| 摘要 |
PROBLEM TO BE SOLVED: To avoid damage to the patterns on a wafer. SOLUTION: The external appearance inspection apparatus for inspecting the patterns on a wafer which is placed on a stage by sending light from a light source to a lens system is provided with an alarming means. For the inspection of the same pattern for the predetermined period or longer or for a plurality of times, the external appearance inspecting apparatus is provided to send an alarm with the alarming means. The alarm issued with the alarming means is preferably an audible alarm or a visible alarm. Moreover, a shutter is also provided to shield radiation of the light from the light source to the pattern. This shutter may be closed simultaneously with generation of the alarm or after issuance of the alarm, and also may be provided adjacently to the light source of the external appearance inspection apparatus. In addition, the external appearance inspection apparatus which is provided with the shutter without inclusion of the alarming means is also provided. COPYRIGHT: (C)2004,JPO
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