| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device which can obtain a glow-state uniform plasma even when the distance between electrodes is increased to plasma-treat a thicker work, and input power to the plasma is increased to improve the plasma treatment capability, and which is high in plasma treatment capability. <P>SOLUTION: A discharge space 3 is formed between electrodes 1, 2 facing each other. A dielectric body 4 is mounted on the discharge space 3 side of at least one of the electrodes 1, 2. A discharge is generated under a pressure of a plasma generation gas near atmospheric pressure, by applying a pulse wave voltage repeating a positive polarity and a negative polarity alternately or an alternating voltage having no pause simultaneously to the one electrode 1 and the other electrode 2, and by overlapping phases of the voltages applied to the respective electrodes 1, 2 with the positive and negative polarities of the voltages inverse to each other. A work 6 is exposed to a plasma 5 generated by the discharge. <P>COPYRIGHT: (C)2004,JPO |
