发明名称 APPARATUS AND METHOD FOR MEASURING POSITION, AND APPARATUS AND METHOD FOR EXPOSURE
摘要 PROBLEM TO BE SOLVED: To accurately measure the position information of a part to be measured, such as, a mark, etc. even when light having a wide wavelength region is used. SOLUTION: The position information of the part WM to be measured is measured by using a signal relating to the part WM to be measured obtained by irradiating the part WM with a sensing beam. An apparatus for measuring the position includes detecting means 58, 66 each for detecting the part WM to be measured at each of a plurality of wavelength regions by irradiating the part WM with the beam, a selecting means 24 for selecting the wavelength region based on a symmetry of each of the signals detected at each of the plurality of the wavelength regions, and a measuring means 24 for measuring the position information of the part WM by using the signal having the selected wavelength region. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004103932(A) 申请公布日期 2004.04.02
申请号 JP20020265548 申请日期 2002.09.11
申请人 NIKON CORP 发明人 NAKAJIMA SHINICHI
分类号 G03F7/20;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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