| 发明名称 |
MATCHING BOX, VACUUM DEVICE USING THE SAME, AND VACUUM PROCESSING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vacuum device which easily regenerates plasma. <P>SOLUTION: In a matching box 2 used for the vacuum device 1, impedance can be changed by changing values of inductances of variable inductance elements 31 and 35. Since the inductance values of the variable inductance elements 31 and 35 can be controlled by controlling a capacity of DC power source, a matching operation is performed at high speed. <P>COPYRIGHT: (C)2004,JPO |
| 申请公布号 |
JP2004104493(A) |
申请公布日期 |
2004.04.02 |
| 申请号 |
JP20020264182 |
申请日期 |
2002.09.10 |
| 申请人 |
ULVAC JAPAN LTD |
发明人 |
YAJIMA TARO;AKAISHI MINORU;HORISHITA YOSHIKUNI |
| 分类号 |
G21K1/00;C23C14/40;C23C14/46;C23C16/00;G21K5/04;H01J27/16;H01J37/08;H01J37/32;H01L21/3065;H03H7/40;H05H1/36;H05H1/46 |
主分类号 |
G21K1/00 |
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