发明名称 MODIFIED PHOTOCATALYST DISPERSION POLISH
摘要 PROBLEM TO BE SOLVED: To provide a polish which can be directly coated on an undercoating without requiring a base coat, and furthermore forms a film exhibiting high stainproofness. SOLUTION: The polish has a dispersion of a modified photocatalyst (A1) obtained by subjecting a photocatalyst (A) to modification treatment with the use of at least one modifying compound (B) to be selected from compounds having at least one structural unit to be selected from the group consisting of a triorganosilane unit to be represented by formula (1): R<SP>1</SP><SB>3</SB>Si-, a monooxydiorganosilane unit to be represented by formula (2): -(R<SP>1</SP><SB>2</SB>SiO)-, and a dioxyorganosilane unit to be represented by formula (3). COPYRIGHT: (C)2004,JPO
申请公布号 JP2004099637(A) 申请公布日期 2004.04.02
申请号 JP20020259314 申请日期 2002.09.04
申请人 ASAHI CHEMICAL CORP 发明人 OGUMA JUNICHI;NAKABAYASHI AKIRA
分类号 B60S3/00;B01J35/02;C09D183/04;C09D183/05;C09G1/00;C09G1/12;C09K3/00;C09K3/18;(IPC1-7):C09G1/00 主分类号 B60S3/00
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