发明名称 Lithographic apparatus and device manufacturing method
摘要 A linear seal seals over a slot formed in a wall of a vacuum chamber of a lithographic projection apparatus. The linear seal includes an elongate sealing member which is locally displaced from the slot at a selectable position such that conduits may pass from outside of the vacuum chamber to the inside of the vacuum chamber at the local displacement of the elongate sealing member.
申请公布号 US2004061844(A1) 申请公布日期 2004.04.01
申请号 US20030458727 申请日期 2003.06.11
申请人 ASML NETHERLANDS B.V. 发明人 VOSTERS PETRUS MATTHIJS HENRICUS;JACOBS HERNES;VAN DER SCHOOT HARMEN KLAAS;RUTGERS PETER
分类号 H01L21/027;G03F7/20;(IPC1-7):G03B27/58;G03B27/42 主分类号 H01L21/027
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