发明名称 |
Substrate processing apparatus and substrate processing system |
摘要 |
Of a substrate-facing surface 24 of an atmosphere blocking member 2, a central area 241 which is faced with an approximately central portion of a substrate S is a flat surface while a periphery edge area 242 which is faced with a periphery edge of the substrate S is an angled surface which becomes closer to the substrate S with a distance toward a periphery edge of the substrate-facing surface 24. Hence, a micro-space SP between the substrate S and the atmosphere blocking member 2 becomes gradually narrower in a direction R which is toward the periphery edge of the substrate S. As an atmosphere gas is fed into the micro-space SP, the atmosphere gas is compressed in the vicinity of a periphery edge of the micro-space SP and a pressure rises. As a result, the micro-space SP becomes positively pressurized as compared with a mist-splashed atmosphere, which effectively prevents a mist from invading other major surface S2 of the substrate S.
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申请公布号 |
US2004055707(A1) |
申请公布日期 |
2004.03.25 |
申请号 |
US20030669520 |
申请日期 |
2003.09.24 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
SATO MASANOBU;MORINISHI KENYA |
分类号 |
B08B17/00;C03C17/00;H01L21/00;H01L21/687;(IPC1-7):C23F1/00;H01L21/306 |
主分类号 |
B08B17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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